Ulterior Motif 1
Ulterior Motif 2
Ulterior Motif 3
Ulterior Motif 4
Ulterior Motif 5
Ulterior Motif 6
Main Gallery & Project Room
November 24, 2015 - December 19, 2015
Thursday, December 3, 6 - 8 pm

Ulterior Motif, curated by Naomi Cohn, features thirteen artists who explore the language of pattern and art. This exhibition reassesses and repositions ornamental pattern as a primary carrier of meaning in a contemporary context. Pattern - fields composed of repeated motifs - is among humans’ earliest creations, employed independently as ornament and symbol in the applied arts of textiles, ceramics, and mosaics, and consistently incorporated into painting and sculpture. Artists include: Linda Daniels, Anoka Faruqee, Hermine Ford, David Fratkin, Glenn Goldberg, Elisabeth Kley, Cal Lane, Jill Levine, Susan Mastrangelo, Colin Thomson, Susan Wanklyn, Max Warsh and Jessica Weiss.

View Catalog: Ulterior Motif_Catalog.pdf

Lecture on New Developments in Water-Based Paint Technology for Artists by Art Guerra on Wednesday, December 2 from 6:30 - 8:30 pm.



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